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sputtering equipment

基本解释溅镀设备

网络释义

1)sputtering equipment,溅镀设备2)sputtering equipment,溅射设备3)Spurge Guard,防溅设备4)splashing device,喷溅设备5)plating equipment,电镀设备6)tin plating equipment,镀锡设备

用法和例句

Design, Manufacture and Application of an Unbalance and Close Magnetron Sputtering Equipment;

非平衡闭合磁场磁控溅射设备的设计、制造及应用

Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess

真空磁控溅射镀膜设备及工艺技术研究

Design of the Control System of Vacuum Magnetron Sputtering & Coating Equipment Based on Industrial Computer and PLC

基于工控机和PLC的真空磁控溅射镀膜设备控制系统设计

Software Design of Real-time Monitoring System of Unbalanced Magnetron Sputtering Ion-plating Equipment in Closed Field;

闭合场非平衡磁控溅射离子镀装备实时监控系统软件设计

Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;

钢基表面射频磁控溅射法制备BN薄膜

The Research on TiN Films Deposited by Magnetron Sputtering;

反应磁控溅射法制备TiN薄膜的研究

Research on Preparation and Properties of Magnetron Sputtering Sb-ZnO Thin Film;

磁控溅射制备Sb-ZnO薄膜及其性能研究

Preparation and Characters of TiAlN Thin Films by Magnetron Sputtering;

磁控溅射制备TiAlN薄膜及性能分析

Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;

直流反应磁控溅射法制备p型ZnMgO薄膜

Preparation of P-type Cu_2O Thin Films by DC Magnetron Sputtering;

磁控溅射法制备P型Cu_2O薄膜

Deposition of TiAlN Film and ZnO Film by Magnetron Sputtering and Related Physical Properties;

磁控溅射制备TiAlN和ZnO薄膜的研究

Research of Preparation and Magnetic Properties of Magnetron Sputtered LSMO Films;

LSMO薄膜磁控溅射制备及磁学性能研究

The Study on Structure and Properties of CeO_2-TiO_2 Films Prepared by Sputtering;

溅射法制备CeO_2-TiO_2薄膜的结构性能研究

Study on Photocatalytic TiO_2 Thin Films Prepared by Magnetron Sputtering Method;

磁控溅射法制备光催化TiO_2薄膜的研究

Research on Carbon Nitride Films Prepared by Ion Beam Sputtering;

离子束溅射法制备C-N薄膜的研究

Study on Preparation and Structure Properties of SiC Films by Sputtering;

SiC薄膜的溅射法制备与结构性能研究

Research of ZnO Photoelectric Films by DC Magnetic Control Sputtering;

直流磁控溅射制备ZnO光电薄膜的研究

Preparation of Zr-Cu Alloy Films by Magnetron Sputtering Technique;

磁控溅射法制备Zr-Cu合金薄膜

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