XPS study of Ni_(49.54)Mn_(29.59)Ga_(20.87) magnetically driven shape memory alloy thin film fabricated by D.C magnetron sputtering technique;
直流磁控溅射Ni_(49.54)Mn_(29.59)Ga_(20.87)磁驱动记忆合金薄膜的XPS研究
Growth and characterization of aluminum nitride films by penning-type discharge plasma sputtering process;
潘宁放电溅射沉积纳米级AlN薄膜的性质
Growth of TiN Film by Modified Ion Beam Enhanced Magnetron Sputtering;
气离溅射离子镀制氮化钛
Cu films sputtered with applied magnet under substrate and their microstructures;
基片下磁场中溅射镀铜薄膜及其微结构
Zinc Oxide Thin Films Prepared Using Microwave ECR Plasma Sputtering Method;
微波电子回旋共振等离子体溅射法沉积ZnO薄膜
Study of TiN Thin Film by Microwave ECR Plasma Reaction Sputtering Deposition;
微波ECR等离子体溅射沉积TiN薄膜的研究
In order to improve appearance and hydrophobicity of waterproof and moisture permeable coatings, the yellowish of sputtered polymeric fluorocarbon films was investigated.
为改善射频溅射法制备的防水透湿涂层的外观和拒水性 ,对涤纶织物基底上的溅射氟碳高分子膜的泛黄问题进行了研究。
By means of the Monte-Carlo simulation based on the binding collision approximation,this paper investigates the sputtering of Silver and Cadmium element targets bombarded by 27 keV Ar+ ions and studies the spatial distribution of sputtered atoms by collision cascade.
用蒙特卡罗方法模拟能量为２７ｋｅＶＡｒ＋轰击Ａｇ和Ｃｄ单元素靶的力学运动，以研究级联碰撞产生的溅射原子的空间分布情况，对计算结果进行适当的数学处理，以得出微分溅射产额角分布。
The XRD patterns of SnO2 thin film sputtered with different methods are compare 1 for their difference in the field of structure.
本文采用三种不同的溅射方法制备具有纳米尺度的SnO2薄膜,针对溅射方式的不同,结合薄膜结构上的差异,对三种溅射方式制备的SnO2薄膜进行了XRD分析比较。
However the waterfall model can not simulate the waterfall effect very well and the system lacks proper model to represent the spattering of stream.
对瀑布起点和终点的波特别处理,表现出水的流动效果,同时增加了溅射模型,使系统能够更好地模拟出一般障碍物,以及正面大的障碍物溅水等常见的动画场景。
The preparation of ZnO film using two methods of spattering is also presented.
还介绍了两种溅射方法制备ZnO薄膜。
Influence of target self-bias in inverted cylindrical RF sputtering on the microstructure and electrical properties of Ba_(0.65)Sr_(0.35)TiO_3 thin films;
倒筒式射频溅射自偏压对Ba_(0.65)Sr_(0.35)TiO_3热释电薄膜结构及性能的影响
Study of 3C-SiC and 4H-SiC films deposited using RF sputtering method;
射频溅射法制备3C-SiC和4H-SiC薄膜
Nanocrystalline TiO_2 thin films were prepared by reactive RF sputtering, then the samples were treated by Ar radio frequency plasma.
用反应射频溅射法在导电玻璃上制备TiO2薄膜,并用Ar射频等离子体对TiO2薄膜进行处理。
Preparation of cubic boron nitride films by radio frequency sputtering;
用射频溅射法制备立方氮化硼薄膜
sputtered film disk
溅射膜盘 -全称 :溅射薄膜磁盘
diode sputter-ion pump
二极管溅射离子泵[抽机]
in line sputterer
直列式离子溅射装置
microprocessor automated sputterer
微处理曝制的溅射装置
plasma sputter combined etching
等离子溅射复合刻蚀
Computer Simulation of the Transportation and the Sputtering of Ions in RF Magnetron Sputtering;
射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算
Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法合成ZrW_2O_8薄膜的研究
Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;
钢基表面射频磁控溅射法制备BN薄膜
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;
射频磁控溅射沉积薄膜的计算机模拟
THE SIMULATION RESEARCH ON ENERGY LOSS AND RANGE OF SPUTTERING IONS
离子溅射能量损失及射程的模拟研究
Effects of Post-Deposition Annealing on ZrW_2O_8 Thin Films by Radio Frequency Magnetron Sputtering
射频磁控溅射ZrW_2O_8薄膜的高温退火研究
Simulation Study of the Sputtering Yield and the Target Erosion on the Magnetron Sputtering Process;
磁控溅射过程中溅射产额及靶材刻蚀的模拟计算研究
X-ray diffraction analysis of Pt film prepared by magnetron sputtering method
磁控溅射Pt薄膜织构的X射线衍射分析
low pressure triode method
低压三极管离子溅射方法
The Application of Sputtering Deposition Technique of TiC to Cutters
溅射沉积碳化钛技术在刀具上的应用
Sandwich Type Distributed Sputtering Ion Pump with φb 6 mm Anode Holes
Φ6毫米阳极孔层状分布式溅射离子泵
Investigation on Nanocrystalline Fe-N Thin Films Grown by Direct Current Magnetron Sputtering;
直流磁控溅射纳米晶Fe-N薄膜的研究
Investigation of High Dielectric Ta_2O_5 Thin Films Deposited by Reactive Sputtering;
反应溅射沉积高介电Ta_2O_5薄膜研究