Reactive ion etching(RIE)of silicon nitride was performed with CHF3,CHF3+CF4,and CHF3+O2as etching gases.
采用CHF3、CHF3+CF4和CHF3+O2三种不同气体体系作氮化硅的反应离子刻蚀(RIE)实验,研究了不同刻蚀气体对刻蚀速率、均匀性和对光刻胶的选择比三个刻蚀参数的影响。
In order to etch good quality holes,the authors used gas-assisted etching(GAE) with focused ion beam.
为获得更好的刻蚀效果,还采用了FIB的气体辅助刻蚀方法(gas-assisted etching,GAE)。
gas discharge etching
气体放电蚀刻[法]
Study of Dry Etching InP/InGaAs Based on Cl_2-based Gas
基于Cl_2基气体的InP/InGaAs干法刻蚀研究
CMOS Compatible Thermopile Infrared Detector Released by Dry Etching;
CMOS兼容的干法刻蚀释放热电堆红外探测器
The Etching of Single Crystal 6H-SiC in Inductively Coupled SF_6/O_2 Plasma
6H-SiC体材料在SF_6/O_2混合气体中的ICP刻蚀
gaseous discharge lamp
(荧光)气体放电管
Study of Porous InP Arrays Formed by Electrochemical Etching;
电化学刻蚀半导体InP纳米多孔阵列及机理研究
Inductive Couple Plasmas Etching Processing of InSb Wafer
电感耦合等离子体刻蚀InSb芯片工艺的研究
Influence of electrolytic etching currentcollector Cu foil on the performance of anode
电解刻蚀集流体铜箔对负极性能的影响
Gas-Assisted Etching of Micro-Hole Lattice Array on Lithium Niobate with Focused Ion Beam
用聚焦离子束气体辅助刻蚀在LiNbO_3上制备亚微米圆孔点阵
pulsed-flash gas-discharge lamp
脉冲闪光气体放电灯
Duplexer of gas discharge tube
气体放电管收发开关
electric discharge excited gaseous laser
放电激励气体激光器
transverse discharge gas laser
横向放电气体激光器
gas discharging radiation counter tube
气体放电辐射计数管
gas-discharge duplexer
气体放电天线双工器
Does the fluorescent lamp discharge in the form of glow or arc
日光灯气体放电是辉光放电还是弧光放电
Modeling and Simulation for Inductively Coupled Plasma Etching of Silicon in MEMS Fabrications;
MEMS加工中电感耦合等离子体（ICP）刻蚀硅片的模型与模拟
The discharge of mercury arc is electric discharge phenomena of low pressure gas and the current density is great.
汞弧光放电是一种低气压气体放电现象,放电电流密度大。