The author analyzes the affecting factors on coal gasification by microwave plasma,and points out microwave energy in coal gasification has wide foreground.
介绍了微波能用于煤炭气化的研究情况 ,分析了煤炭微波等离子体气化的影响因素 ,指出了微波能在煤炭气化的发展前
Influence of discharge current on hot cathode plasma chemical vapor deposition of diamond films;
放电电流对热阴极等离子体化学气相沉积金刚石膜影响
Effect of plasma chemical vapor deposition parameters on electron property in Ar plasma;
等离子体化学气相沉积参量对Ar等离子体电子特性的影响
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中,热阴极辉光放电特性与金刚石膜沉积工艺的关系。
DEPOSITION THEORY OF THIN HARD PCVD COATINGS;
等离子体化学气相沉积(PCVD)硬质膜成膜理论
Si B N composite films had been prepared at proper processing parameters by RF PCVD.
使用工业射频等离子体化学气相沉积 (RF -PCVD)设备 ,通过控制合理的工艺参数 ,在不同的基体负偏压下 ,分别制备出了Si B N非晶以及含有h BN、c BN显著结晶相的Si B N复合薄膜。
SnO 2 Sb thin film is prepared with PCVD The film possesses better gas sensitivity When temperature rises, the response time maintains almost the same but the recovery time reduces and the sensibility gets higher When the temperature reaches 200℃ or more, the sensitivity maintains stable The difference between the sensibility of the resistors of different resistance is small (4 refs
利用等离子体化学气相沉积法制备了ＳｎＯ２－Ｓｂ导电薄膜，测试了ＳｎＯ２－Ｓｂ的气敏效应。
Investigation on the Property of Semicoke from Shenmu Coal Plasma Gasification
神木烟煤等离子体气化所制半焦的特性研究
plasma activated chemical vapour deposition
等离子体化学气相沉积
gas plasma oxidizer
气体等离子氧化装置
Investigations on Flue Gas Desulfurization Combining Plasma with Catalyst;
烟气等离子体-催化SOx转化脱除研究
Study on the New Technology of Conversion of Natural Gas Through Low Temperature Plasma;
低温等离子体天然气转化新工艺研究
Simulation of evolution of one-dimensional cylindrical atmosphere plasma
一维柱状大气等离子体演化过程模拟
plasma gas chromatography
等离子体气相色谱法
Advances in catalysis non-thermal plasma reactor for air pollution control
催化型低温等离子体反应器净化废气研究进展
Advances in Researches on Catalysis-Assisted Non-Thermal Plasma Technology for Air Pollution Control
低温等离子体-催化协同空气净化技术研究进展
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
The Research of Ammonia Decomposition via Plasma-catalysis;
等离子体催化氨气裂解制氢的初步研究
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
Effects of Operating Conditions and Additives on Plasma Coal Gasification;
操作条件和添加物对等离子体煤气化的影响
A Study of Kinetic Model for the Automobile Exhaust Control Using Non-Thermal Plasma;
低温等离子体净化汽车尾气动力学模型研究
The Research on Natural Gas Transferred into C_2 Hydrocarbons Was Studied by the Method of Plasma on Line;
天然气等离子体法转化为碳二烃的在线研究
Study of Ammonia Synthesis by Means of High Pressure Non-equilibrium Plasma Chemistry;
高气压非平衡等离子体化学合成氨的研究
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究