Meanwhile,a model for lithography development based on the Dill algorithm,the Kim model and the ray algorithm is established.
为此提出基于层次结构的三维场景绘制点渲染算法,并引入网格插值法填补显影模拟中在光刻胶表面出现的空洞,用Dill算法、Kim模型和介质光线算法建立光刻显影模型。
ozone induced scumming
臭氧感生未显影光刻胶形成
cinematographic film, sensitized, exposed, not developed
感光电影胶片,已曝光未显影
film for photoelectric sound recording, sensitized, exposed, not developed
光电录音用感胶片,已曝光,未显影
photographic film, sensitized, exposed, not developed
照相感光胶片,已曝光未显影
Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings
光刻胶全息光栅显影监测的模拟与实验
cinematographic film,sensitized bu no exposed
未曝光的感光电影胶片
cinematographic film, sensitized, unexposed
感光电影胶片,未曝光
Simulation of Point Based Rendering for Three Dimensional Lithography Development
用点渲染算法实现光刻胶显影过程的三维模拟(英文)
microfilm exposed and developed
缩微胶片,已曝光和显影
In microelectronics, the process of removing material, on a chip, left exposed by the exposure and development of the photoresist.
在微电子技术中,通过曝光并显影光刻胶除去芯片上的物质露出剩余部分的工艺。
photographic film, exposed and developed, for offset reproduction
照相胶片,已曝光和显影胶印印件用
roentgen films,sensitized but not exposed
未曝光X光感光胶片
photoresist controlled etch
光刻胶掩蔽控制腐蚀
photographic sensitized film, unexposed
照相感光胶片纸,未曝光
Influence of Fluorescent Glue Packaging Technology on the Color Rendering Index of High Power LED
大功率LED荧光胶封装工艺对其显色性能的影响
To form the images, one simply projects laser light through the developed film.
为了显象、我们只要使激光射过已显影的胶片就可。
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms
光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响