5)Ti_3O_(12) thin films have been grown on Si substrates by a chemical solution deposition method.
采用化学溶液分解法(CSD)在S i衬底上制备了Sm0。
1)2Ti2O7 thin films were prepared on p-Si(111) substrates by a chemical solution deposition method.
采用化学溶液分解法(CSD)在p-Si(111)衬底上制备了(Bi0。
8Ti2O7 thin films have been prepared on p-Si(111) substrates by a chemical solution deposition method.
采用化学溶液分解法(CSD)在p型Si(111)衬底上制备了Nb0。